The PARADIM Thin Film Growth Facility at Cornell provides unprecedented capability for the growth and characterization of thin films and interfaces of inorganic materials. Some of this capability is available now; other are still in development. Prior to 2018, thin film growth projects were handled by a cooperative arrangement with Prof. Schlom and Prof. Shen, on previously existing equipment. The new thin film capabilities made possible by the PARADIM award are now online for PARADIM users.
The signature tool will be an integrated instrument consisting of an oxide MBE system, an ARPES system, and an MOCVD system, all sharing a common ultrahigh vacuum connection. This tool builds upon the expertise of Profs. Shen and Schlom who were the first in the world to integrate ARPES with an MBE system for the growth of complex oxides. This integrated instrument will extend this uniqueness a step further by being the first system in the world to integrate MOCVD, MBE, and ARPES in a single system. This combination will bring the analytical power of ARPES to MOCVD-grown films, something that has never been done, and also enable heterostructures to be grown by a combination of MBE and MOCVD. The interconnection will allow materials to be created and interrogated by any user-desired sequence among MBE, ARPES, and MOCVD. For example, a user may measure the electronic structure (using ARPES) of a layer grown by MBE after a monolayer of transition metal dichalcogenide has been added to it by MOCVD.
The MBE system has eleven sources that can be used simultaneously and changed/refilled without breaking growth chamber vacuum. Materials can be selected from any of the sixty-two different elements shown in color on the periodic table to the right. This gives PARADIM users unprecedented flexibility in exploring new materials by design. The MBE system is currently available for users.
The ARPES system is based on prior designs and is being custom built utilizing major components from Scienta Omicron.
The MOCVD system design and purchase is still pending and will be completed once the ARPES and MBE are installed, coupled together, and available to users.
In addition to the integrated MOCVD described above, PARADIM offers two MOCVD systems for the growth of “standard” transition metal dichalcogenide films. These systems are custom built based upon a design developed by PARADIM in-house research team member Prof. Jiwoong Park at the University of Chicago. The two MOCVDs have been built and installed in a fully renovated PARADIM laboratory designed for this purpose. They are being used by PARADIM staff and interns to grow samples for distribution to users, based on proven recipes developed in Professor Park’s lab. So far, Professor Park’s group has developed recipes for depositing single-monolayer thick films of MoS2, MoSe2, WS2, and WSe2 homogeneously over 4” diameter substrates.
The new Cornell PARADIM Thin Film Facility is housed in over 1400 sq. ft. of newly renovated space in Duffield Hall, renovated at a cost to Cornell funds of greater than $2.75M.
PARADIM staff scientists for thin film include Dr. Hanjong Park (MBE), Dr.Luca Moreschini (ARPES) and Don Werder (MOCVD, in addition to microscopy). Please contact them directly for specific questions about capabilities and availability.